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공정소개 - 상세페이지

공정소개

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댓글 0건 조회 332회 작성일 19-10-23 15:15

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Wet station & Single Scrubber
Cleaning : 
Wafer wet cleaning to remove organic and inorganic materials, pollutants and particles
SC1 / SC2, D.i Water Cleaning Efficiency is Maximized.
( Silicon, Glass, Quart, SiC, Shapphire, Ceramic etc )

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